基于量子化学计算的配位剂对电沉积影响机理的研究

基于量子化学计算的配位剂对电沉积影响机理的研究

Electeoplating and Finishing ›› 2025, Vol. 44 ›› Issue (05) : 54-61. DOI: 10.19289/j.1004-227x.2025.05.010

Author information +

History +

CLC number

TQ153

Cite this article

Download Citations

Comments

Accesses

Citation

Detail

Sections

Recommended

/

〈

〉